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Meco PPL

The Meco Panel Plating Line (PPL) electroplates a sub-micron layer of Copper, Indium and Gallium onto a glass substrate to form the absorber layers of a CIGS thin film solar cell. Electrochemical deposition offers manifold advantages compared to vacuum deposition techniques: a nearly 100% efficient utilization of Cu, In and Ga metals, no vacuum conditions required, a smaller footprint and lower facility requirements! To further develop high efficiency CIGS solar cells by electrochemical deposition of Cu, In and Ga Meco is working together with the Solliance Initiative.


  • Substrate: Glass Panel
  • Seed layer: Mo/Cu
  • Substrate size: 600 x 1,200 mm
  • Substrate thickness: 2.8 to 3.5 mm
  • Metal options: Cu, In and Ga
  • Production capacity: 20 - 25 MW
  • Unique patented contact/transport system
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